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Trench processing of GaN for power devices

We will introduce the trench processing of GaN based on our past processing achievements.

Our company has a proven track record as a semiconductor manufacturing equipment manufacturer, providing ICP etching equipment, CVD equipment, and process technology for the production of GaN-based light-emitting devices. We also offer equipment capable of trench processing and mesa processing for 4H-SiC power devices. This document introduces the trench processing of GaN based on our past processing achievements. [Contents] ■ Introduction ■ Schematic diagram of trench MOSFET ■ Trench processing of GaN ■ Etching results ■ Conclusion *For more details, please refer to the PDF document or feel free to contact us.